Description

Patch Holic

Soothing Mask is a sheet mask designed for sensitive, irritated, and tired skin. Its formula combines centella asiatica extract, a hyaluronic acid complex, panthenol, and allantoin to provide immediate relief and intense hydration. It acts like a compress, soothing redness, supporting skin regeneration, and strengthening its protective barrier.
The delicate essence absorbs quickly without weighing down the skin, making the mask suitable for both daily regeneration and SOS after sunbathing or cosmetic treatments.

Ingredients

Aqua, Butylene Glycol, Glycerin, Glycereth-26, PEG/PPG-17/6 Copolymer, Isopentyldiol, Alcohol, 1,2-Hexanediol, PEG-75, Hydroxyacetophenone, Panthenol, Carbomer, Arginine, Polyglyceryl-10 Laurate, Polyglyceryl-10 Myristate, Disodium Edta, Allantoin, Hydroxyethylcellulose, Propanediol, Betaine, Parfum, Sodium Hyaluronate Crosspolymer, Hydrolyzed Glycosaminoglycans, Sodium Hyaluronate, Mentha Rotundifolia Leaf Extract, Diospyros Kaki Leaf Extract, Chamomilla Recutita Leaf Extract, Monarda Didyma Leaf Extract, Ocimum Basilicum Leaf Extract, Perilla Ocymoides Leaf Extract, Benzyl Glycol, Hydrolyzed Hyaluronic Acid, Disodium Phosphate, Polysorbate 60, Centella Asiatica Extract, Chamomilla Recutita Flower Extract, Rosa Damascena Extract, Melaleuca Alternifolia Leaf Extract, Ethylhexylglycerin, Sodium Phosphate, Hyaluronic Acid, Raspberry Ketone.

Properties

Patch Holic Soothing Mask with Centella Asiatica and Moisturizing Complex

• soothes and relieves irritation thanks to the extract of Centella asiatica,
• strengthens the skin's protective barrier and supports its regeneration,
• intensively moisturizes thanks to the hyaluronic acid complex in 4 forms,
• has antibacterial and cleansing properties thanks to tea tree oil,
• reduces redness and brings relief thanks to allantoin and chamomile extract,
• refreshes and smoothes the skin, improving its elasticity,
• The light essence does not burden the skin, leaving it soft and relaxed.

Destiny

This sheet mask is designed for all skin types, especially sensitive, irritated, dehydrated, and tired skin. Recommended for quick relief after sun exposure, cosmetic treatments, or for daily regeneration of skin exposed to stress and external factors.

Use

Cleanse and tone your skin. Apply the mask to your face and leave on for 10–20 minutes. Then, remove the mask and gently pat any remaining essence into your skin until fully absorbed.

Comments

Do not use on damaged or irritated skin. Avoid use if allergic to any of the ingredients.

For external use only. If irritation or rash occurs, discontinue use and consult a physician.

Do not use immediately before sun exposure. Avoid contact with eyes. Do not store in places with extremely high or low temperatures. Keep out of the reach of children.